the equipment is batch type resistance furnace, mainly used in the heating treatment of pi film , graphite and carbon material.
|
model parameter |
lab usage |
production usage |
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|
nti-kll-54w |
nti-kll-243w |
nti-kll-300w |
nti-kll-400w |
nti-kll-720w |
nti-kll-720 nw |
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|
working size |
mm |
300×300×600 |
450×450×1200 |
500×500×1200 |
500×500×1600 |
600×600×2000 |
（600-800）×（600-800）×（2000-4000） |
|
control process |
|
thyristor control |
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|
heating type |
/ |
resistance heating |
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|
cooling device |
|
fan |
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cooling time |
|
4h from 1400-200℃ |
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|
ht zone capacity |
l |
54 |
243 |
300 |
400 |
720 |
720 n |
|
loading weight |
g |
ht zone capacity × density (g/cm³)×1000 remark：1l=1000cm³ |
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|
ultimate vacuum |
pa |
20 |
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|
if power |
kw |
50/100 |
105/210 |
120/240 |
135/270 |
189/378 |
189-500/378-1000 |
|
heating zone |
zone |
1 |
3 |
3 |
3 |
3 |
3-6 |
|
max. working temperature |
℃ |
2400 |
2400 |
2400 |
2400 |
2400 |
2400 |
|
usual working temperature |
℃ |
1600/2300 |
1600/2300 |
1600/2300 |
1600/2300 |
1600/2300 |
1600/2300 |
|
temperature unifomity |
℃ |
±5 |
±5 |
±5 |
±5 |
±5 |
±10 |
|
working environment |
/ |
vacuum or ar, n2 atmosphere protection( micro positive pressure) |
|
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